3D nanopolymerization and damage threshold dependence on laser wavelength and pulse duration

Abstract The dependence of the polymerization and optical damage thresholds in multi-photon (MPP) lithography was studied using a broadly-tunable laser system with group delay dispersion (GDD) control. order non-linearity light–matter interaction mechanisms were investigated resolution bridges method for non-photosensitized SZ2080 TM photosensitized + IRG369 prepolymers. Energy deposition, voxel dimension growth, size dynamic fabrication window (DFW) measured 700–1300 nm wavelength range at three different pulse durations sample – 100, 200 300 fs. Polymerization observed all wavelengths without significant differences achieved minimal spatial ( < 300 ${< } 300$ nm). This despite broad excitation used which spanned two- three-photon absorption bands, spectra lateral longitudinal growth dynamics revealed an abrupt change power variation DFW from 1 1250 to 29 700 nm. result can be interpreted as consequence instantaneous refractive index lowering but not threshold. optimization energy delivery material by wavelength-tunable source duration control experimentally validated. These findings are uncovering complexity useful further development MPP technology.